Methodology for generating exposure tool specification for alternating phase shift mask application for 70 nm node

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 4691 I, Issue , 2002, Pages 336-347

  Lai, Kafai ^a   Gallatin, Gregg ^a   Rosenbluth, Alan E ^a   Fonseca, Carlos ^a   Liebmann, Lars ^a   Progler, Chris ^a  

^a IBM RESEARCH   (United States)

Author keywords

193 nm; Alternating phase shifting mask; DUV; Lens aberration; Photolithography; Zernike polynomials

Indexed keywords

ABERRATIONS; COMPUTER SIMULATION; CROSSTALK; LENSES; MASKS; MONTE CARLO METHODS; OPTICAL CORRELATION; OPTICAL RESOLVING POWER; PHASE SHIFT; POLYNOMIALS;

ALTERNATING PHASE SHIFTING MASKS (ALTPSM);

PHOTOLITHOGRAPHY;

EID: 0036416659     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.474583     Document Type: Conference Paper

References (10)

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7. final = Io ⊗ PSF, where PSF is the point spread function of flare which is very long range and thus depend on the pattern density of the ambient environment, circa 100um vicinity.
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