Measurement of lens aberration by using In-situ Interferometer and classification of lens for correct application

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 4000 (I), Issue , 2000, Pages 30-39

  Seong, Nakgeuon ^a   Yeo, Geesung ^a   Cho, Hanku ^a   Moon, Jootae ^a  

^a SAMSUNG Electronics   (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

ABERRATIONS; INTERFEROMETERS; LENSES; OPTICAL VARIABLES MEASUREMENT;

LAYER PATTERNING;

PHOTOLITHOGRAPHY;

EID: 0033699223     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.389032     Document Type: Conference Paper

References (5)