A method to predict CD variation caused by dynamic scanning focus errors

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 4346, Issue 1, 2001, Pages 408-419

  Hagiwara, Tsuneyuki ^a   Mizutani, Hideo ^a   Okita, Shinichi ^a   Kondo, Naoto ^a  

^a NIKON CORPORATION   (Japan)

Author keywords

Across the field CD variation; Isolated line; Resist process; Scanner; Synchronization error

Indexed keywords

ERROR ANALYSIS; FOCUSING; IMAGE ANALYSIS; LENSES; PROJECTION SYSTEMS; SCANNING;

FOCUS ERRORS;

PHOTOLITHOGRAPHY;

EID: 0035759060     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.435741     Document Type: Conference Paper

References (4)

1. I. Grodnensky, et al., "Technique for optical characterization of exposure tool imaging performance down to 100 nm," Journal of Vacuum Science & Technology B, 17(6), p. 3285-3290, 1999.
2. I. Grodnensky, et al., "Method for forming a critical dimension test structure and its use," U.S. Patent #6094256, 25 July 2000.
3. K. Suwa, H. Tateno, N. Irie, S. Hirukawa "Automatic laser scanning focus detection method using printed focus pattern," Optical/Laser Microlithography, SPIE Vol. 2440, p.712,1995.
4. K. Ota, N, Magome, K. Nishi, "New alignment sensors for wafer stepper," Optical/Laser Microlithography, SPIE Vol. 1463, p.304,1991.