Evaluation of lithographic imaging performance by optical area measurement

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 4689 II, Issue , 2002, Pages 846-851

  Grodnensky, I ^a   Mizutani, S ^a   Slonaker, S ^a  

^a NIKON PRECISION INC   (United States)

Author keywords

Critical dimension; Double exposed marks; Exposure tool; Imaging performance; Mark area measurement; Mark image irradiance; Optical metrology

Indexed keywords

CAMERAS; CHARGE COUPLED DEVICES; IMAGING TECHNIQUES; MEASUREMENT THEORY; SCANNING ELECTRON MICROSCOPY;

OPTICAL METROLOGY;

LITHOGRAPHY;

EID: 0036031280     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.473410     Document Type: Conference Paper

References (3)

1. I. Grodnensky, K. Suwa, K. Ushida, and E. Johnson, "Method for forming critical dimension test structure and its use," US Patent # 6094256, 2000.
2. I. Grodnensky, E. Johnson, and S. Slonaker, "Method and apparatus for dimension measurement of a pattern formed by lithographic exposure tools," US Patent application, 2001.
3. Jack D. Gaskill, Linear systems, Fourier transforms, and optics, John Wiley & Sons, New York, 1978.