Virtual interface approximation model applied to spectroscopic ellipsometry for on-line composition determination of metalorganic chemical vapor deposition grown ternary nitrides

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 21, Issue 4, 2003, Pages 1825-1827

  Bonanni, A ^a   Schmidegg, K ^a   Montaigne Ramil, A ^a   Sitter, H ^a   Hingerl, K ^b   Stifter, D ^c  

^a JOHANNES KEPLER UNIVERSITY LINZ   (Austria)

^b INSTITUTE FOR MICROELECTRONICS   (Austria)

^c Upper Austrian Research GmbH   (Austria)

Author keywords

[No Author keywords available]

Indexed keywords

ALUMINUM COMPOUNDS; ELLIPSOMETRY; GALLIUM NITRIDE; INTERFACES (MATERIALS); METALLORGANIC CHEMICAL VAPOR DEPOSITION; TERNARY SYSTEMS;

MULTILAYER STRUCTURES;

NITRIDES;

EID: 0141569700     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.1585078     Document Type: Conference Paper

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