Development of Xe-filled capillary discharge extreme ultraviolet radiation source for semiconductor lithography

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 5037 II, Issue , 2003, Pages 767-775

  Teramoto, Yusuke ^a   Sato, Hiroto ^a   Bessho, Kazunori ^a   Miyauchi, Koji ^a   Ikeuchi, Mitsuru ^a   Okubo, Keisuke ^a   Yoshioka, Masaki ^a   Toyoda, Koichi ^b  

^a Hiratsuka Research and Devmt Ctr   (Japan)

^b TOKYO UNIVERSITY OF SCIENCE   (Japan)

Author keywords

Capillary; Discharge; EUV; Lithography; Plasma; Pulse; Z pinch

Indexed keywords

ELECTRIC CURRENTS; ELECTRIC POTENTIAL; OPTICS; PLASMA SOURCES; SEMICONDUCTOR DEVICE MANUFACTURE; SPECTROSCOPIC ANALYSIS; SPECTRUM ANALYSIS; ULTRAVIOLET RADIATION; XENON;

RADIATION SOURCE DEVELOPMENT; SEMICONDUCTOR LITHOGRAPHY; SOLID STATE MAGNETIC PULSE COMPRESSION GENERATOR; ULTRAVIOLET RADIATION SOURCE;

LITHOGRAPHY;

EID: 0141501241     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.483704     Document Type: Conference Paper

References (10)

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