CD-SEM image acquisition effects on 193nm resists line slimming

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 5038 I, Issue , 2003, Pages 618-623

  Sullivan, N ^a   Mastovich, M ^a   Bowdoin, S ^a   Brandom, R ^a  

^a SCHLUMBERGER   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ELECTRON BEAMS; IMAGE ANALYSIS; SCANNING ELECTRON MICROSCOPY; SURFACE ROUGHNESS;

CRITICAL DIMENSION; IMAGE ACQUISITION EFFECTS; LINE EDGE ROUGHNESS; RESISTS LINE SLIMMING;

PHOTORESISTS;

EID: 0141497109     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.487604     Document Type: Conference Paper

References (13)

1. Ke, C.M., et al., "The effect of various ArF resist shrinkage amplitude on CD bias," Proc SPIE Vol. 4689, 997, (2002)
2. R. Hershey, Private communication
3. C.P. Ausschnitt, et al., "Seeing the forest for the trees: a new approach to CD control," Proc. SPIE 3332-212, 1998.
4. T. Hoffmann, et al., "Investigation of 193 nm Resist Slimming During CD-SEM Measurements", Yield Management Solutions, Fall 2001
5. B. Su et al., "Analyzing and characterizing 193nm resist slimming", Solid State Technology, May 2001
6. M. Vasconi et al., "193nm Metrology: facing severe e-beam/resist interaction phenomena", SPIE Vol. 4344 (2001)
7. A. Habermas, et al., "193nm CD Slimming Under SEM: Modeling the Mechanism", Proceedings SPIE 4899-13, 2002 Statgraphics Plus, Manugistics, Inc.
8. M. Erken et al., "Line edge roughness and its increasing importance," Proc. ARCH Interface, 2002
9. M. Padmanaban et al., Proc. SPIE Vol. 4690, 606, (2002)
10. N. Sullivan et al., "Electron Beam Metrology of 193 nm Resists at Ultra Low Voltage" Proc SPIE Vol. 5038, [This volume], (2003)
11. T. Sarubbi et al., Proc. SPIE Vol. 4345, 211 (2001)
12. Takanori Kudo, Jun-Bom Bae, Ralph R. Dammel, Woo-Kyu Kim, Douglas McKenzie, M. Dalil Rahman, Munirathna Padmanaban Waiman Ng, "CD Changes Of 193 nm Resists During SEM Measurement", Proc SPIE Vol 4345, 179 (2001)
13. Peter Ko, Private communication