Reactive solid-phase epitaxy - A novel growth method for single-crystalline thin films of complex oxides with superlattice structure

Materials Research Society Symposium - Proceedings

Volumn 747, Issue , 2003, Pages 257-265

  Ohta, H ^a   Nomura, K ^b   Hiramatsu, H ^a   Suzuki, T ^c   Ueda, K ^b   Orita, M ^a   Hirano, M ^a   Ikuhara, Y ^d   Hosono, H ^b  

^a JAPAN SCIENCE AND TECHNOLOGY AGENCY   (Japan)

^b TOKYO INSTITUTE OF TECHNOLOGY   (Japan)

^c JAPAN FINE CERAMICS CENTER   (Japan)

^d UNIVERSITY OF TOKYO   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ANNEALING; COMPOSITION; CRYSTALLOGRAPHY; SEMICONDUCTOR SUPERLATTICES; THIN FILMS; ZINC OXIDE;

EPITAXIAL LAYERS;

SINGLE CRYSTALS;

EID: 0043064037     PISSN: 02729172     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

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