Determination of layer-thickness fluctuations in Mo/Si multilayers by cross-sectional HR-TEM and X-ray diffraction

Applied Physics A: Materials Science and Processing

Volumn 77, Issue 5, 2003, Pages 607-611

  Aschentrup, A ^a   Hachmann, W ^a   Westerwalbesloh, T ^a   Lim, Y C ^a   Kleineberg, U ^a   Heinzmann, U ^a  

^a BIELEFELD UNIVERSITY   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

COMPUTER SIMULATION; ELECTROMAGNETIC WAVE REFLECTION; MULTILAYERS; SILICON; TRANSMISSION ELECTRON MICROSCOPY; X RAY DIFFRACTION ANALYSIS;

POWER SPECTRAL DENSITY (PSD);

MOLYBDENUM;

EID: 0042971509     PISSN: 09478396     EISSN: None     Source Type: Journal    
DOI: 10.1007/s00339-003-2130-8     Document Type: Article

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