Low-pressure chemical vapor deposition of TaCN films by pyrolysis of ethylamido-tantalum

Journal of Crystal Growth

Volumn 220, Issue 4, 2000, Pages 604-609

  Ohshita, Yoshio ^a   Ogura, Atsushi ^b   Hoshino, Asako ^c   Hiiro, Shigeki ^c   Machida, Hideaki ^c  

^a TOYOTA TECHNOLOGICAL INSTITUTE   (Japan)

^b NEC CORPORATION   (Japan)

^c TRI Chemical Laboratory Inc   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

AMORPHOUS FILMS; CRYSTAL MICROSTRUCTURE; ELECTRIC CONDUCTIVITY OF SOLIDS; HYDROGEN; METALLORGANIC CHEMICAL VAPOR DEPOSITION; NITRIDES; TANTALUM COMPOUNDS; THERMAL EFFECTS; THIN FILMS; TRANSMISSION ELECTRON MICROSCOPY;

TANTALUM CARBON NITRIDE;

SEMICONDUCTING FILMS;

EID: 0034506659     PISSN: 00220248     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0022-0248(00)00816-2     Document Type: Article

References (4)

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