Pulsed laser deposited vanadium oxide thin films for uncooled infrared detectors

Sensors and Actuators, A: Physical

Volumn 107, Issue 1, 2003, Pages 62-67

  Rajendra Kumar, R T ^a   Karunagaran, B ^a   Mangalaraj, D ^a   Narayandass, Sa K ^a   Manoravi, P ^b   Joseph, M ^b   Gopal, Vishnu ^c  

^a BHARATHIAR UNIVERSITY   (India)

^b INDIRA GANDHI CENTRE FOR ATOMIC RESEARCH   (India)

^c SOLID STATE PHYSICS LABORATORY   (India)

Author keywords

Microbolometers; Pulsed laser deposition; Uncooled infrared detectors; Vanadium oxide

Indexed keywords

BOLOMETERS; INFRARED DETECTORS; PULSED LASER DEPOSITION; VANADIUM COMPOUNDS;

MICROBOLOMETERS;

THIN FILMS;

EID: 0042281881     PISSN: 09244247     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0924-4247(03)00233-4     Document Type: Article

References (16)

1. A. Tanaka, S. Mastsmoto, N. Tsukamoto, S. Itoh, K. Chiba, T. Endoh, A. Nakazato, K. Okyuma, Y. Kumazawa, M. Hijikawa, H. Gotoh, T. Tanaka, T. Teranishu, Infrared focal plane array incorporating silicon IC process compatible bolometer, IEEE Trans. Electron. Dev. 43 (1996) 1844-1850.
2. S. Sedky, P. Fiorini, M. Caymax, A. Verbiste, C. Baert, IR bolometers made of polycrystalline silicon germanium, Sens. Actuators A 66 (1998) 193-199.
3. M.H. Unewisse, B.I. Craige, R.J. Watson, The growth and properties of semiconductor bolometers for infrared detection, SPIE 2554 (1995) 43-47.
4. A. Jahanzeb, C.M. Travers, Z. Celik-Butler, A semiconductor YbaCuO microbolometer for room temperature IR imaging, IEEE Trans. Electron. Dev. 44 (1997) 1795-1801.
5. W. Radford, D. Murphy, M. Ray, S. Propst, A. Kennedy, J. Kgiro, J. Woolay, K. Seach, R. Coda, G. Lung, E. Moody, D. Gleichman, S. Baur, 320 × 240 silicon microbolometer uncooled IRFPAs with on-chip offset correction, SPIE 2746 (1996) 82-92.
6. H. Wada, M. Nagashima, Design and performance of 256 × 256 bolometer type uncooled infrared detector, SPIE 3379 (1998) 90100.
7. H. Jerominek, F. Picard, D. Vincent, Vanadium oxide films for optical switching and detection, Opt. Eng. 32 (9) (1993) 2092-2099.
8. B.E. Cole, R.E. Higashi, R.A. Wood, Monolithic two-dimensional arrays of micromachined microstructures for infrared applications, Proc. IEEE 86 (8) (1998) 1679-1686.
9. x thin films, Infrared Phys. Technol. 42 (2001) 87-90.
10. 3 by pulsed laser deposition, Solid state Ionics 144 (2001) 339-346.
11. R. Flannery, J.E. Miller, Status of uncooled IR imagers, in infrared imaging systems: design, analysis, modelling and testing, Proc. SPIE 1689 (1992) 379-395.
12. D.B. Chrisey, G.K. Hubler (Eds.), Pulsed Laser Deposition of Thin Films, Wiley, New York, 1994.
13. P.R. Willmot, J.R. Hubler, Pulsed laser vaporization and deposition, Rev. Mod. Phys. 72 (2000) 315-332.
14. H. Takei, S. Koide, Growth and electrical properties of vanadium oxide single crystals by oxychrolide decomposition method, J. Phys. Soc. Jpn. 21 (1966) 1010-1014.
15. E.E. Chain, Optical properties of vanadium dioxide and vanadium pentoxide thin films, Appl. Opt. 30 (19) (1991) 2782-2787.
16. M. Ghanashyam Krishna, Y. Debague, A.K. Battacharya, X-ray photoelectron spectroscopy and spectral transmittance study of stoichiometry in sputtered vanadium oxide films, Thin Solid Films 312 (1998) 116-122.