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Volumn 165, Issue 1, 2000, Pages 34-37

XPS analysis of Pb(Zr0.52Ti0.48)O3 thin film after dry-etching by CHF3 plasma

Author keywords

[No Author keywords available]

Indexed keywords

DIELECTRIC FILMS; DRY ETCHING; FERROELECTRIC MATERIALS; GAMMA RAYS; LEAD COMPOUNDS; MACHINING; THIN FILMS; X RAY PHOTOELECTRON SPECTROSCOPY;

EID: 0034275927     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0169-4332(00)00316-0     Document Type: Article
Times cited : (15)

References (12)


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.