Etching Properties of SrBi2Ta2O9 Thin Films Using CF4/Ar Magnetically Enhanced Inductively Coupled Plasmas for FRAM

Journal of the Korean Physical Society

Volumn 39, Issue 1, 2001, Pages 189-192

  Kim, Dong Pyo ^a   Kim, Chang Il ^a  

^a Chung Ang University   (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0035602044     PISSN: 03744884     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Article

References (8)

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