Electrical properties of boron-doped diamond films synthesized by MPCVD on an iridium substrate

Diamond and Related Materials

Volumn 12, Issue 8, 2003, Pages 1396-1401

  Kusakabe, Katsuki ^a   Sobana, Akira ^a   Sotowa, Ken Ichiro ^a   Imato, Toshihiko ^a   Tsubota, Toshiki ^b  

^a KYUSHU UNIVERSITY   (Japan)

^b KUMAMOTO INDUSTRIAL RESEARCH INSTITUTE   (Japan)

Author keywords

CVD; Diamond film; Electrical properties; Heteroepitaxy; Plasma

Indexed keywords

BORON; DOPING (ADDITIVES); ELECTRIC PROPERTIES; FILM GROWTH; IRIDIUM; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; SYNTHESIS (CHEMICAL);

NUCLEAS;

DIAMOND FILMS;

DIAMOND;

EID: 0041767227     PISSN: 09259635     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0925-9635(03)00166-3     Document Type: Article

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