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Volumn 8, Issue 8-9, 1999, Pages 1470-1475

Electrical Properties of B-doped homoepitaxial diamond films grown from UHP gas sources

Author keywords

Boron doping; Catholuminescence; Diamond films; Electrical properties; Hall effect measurement; N V center; Nitrogen

Indexed keywords

ANNEALING; CARRIER CONCENTRATION; CATHODOLUMINESCENCE; CHEMICAL VAPOR DEPOSITION; CONTAMINATION; DOPING (ADDITIVES); ELECTRIC PROPERTIES; HALL EFFECT; ION BOMBARDMENT; NITROGEN; SEMICONDUCTING BORON; VACUUM APPLICATIONS;

EID: 0032594308     PISSN: 09259635     EISSN: None     Source Type: Journal    
DOI: 10.1016/s0925-9635(99)00073-4     Document Type: Article
Times cited : (24)

References (8)


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.