Heteroepitaxial diamond thin film growth on Ir(0 0 1)/MgO(0 0 1) substrate by antenna-edge plasma assisted chemical vapor deposition

Journal of Crystal Growth

Volumn 237-239, Issue 1 4 II, 2002, Pages 1277-1280

  Tachiki, Minoru ^a   Fujisaki, Toyokatsu ^a   Taniyama, Norikazu ^b   Kudo, Minoru ^b   Kawarada, Hiroshi ^a  

^a WASEDA UNIVERSITY   (Japan)

^b Micro Denshi Co Ltd   (Japan)

Author keywords

A1. Nucleation; A3. Chemical vapor deposition processes; A3. Vapor phase epitaxy; B1. Diamond

Indexed keywords

DIAMOND FILMS; FILM GROWTH; NUCLEATION; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; REFLECTION HIGH ENERGY ELECTRON DIFFRACTION; SCANNING ELECTRON MICROSCOPY; SUBSTRATES; THIN FILMS;

HETEROEPITAXIAL FILMS;

VAPOR PHASE EPITAXY;

EID: 0036530430     PISSN: 00220248     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0022-0248(01)02067-X     Document Type: Article

References (10)