The indices of refraction of molecular-beam epitaxy-grown BexZn1-xTe ternary alloys

Journal of Electronic Materials

Volumn 32, Issue 7, 2003, Pages 742-746

  Peiris, F C ^a   Buckley, M R ^a   Maksimov, O ^b   Munoz, M ^b   Tamargo, M C ^b  

^a KENYON COLLEGE   (United States)

^b CITY UNIVERSITY OF NEW YORK   (United States)

Author keywords

BexZn1 xTe; Ellipsometry; Index of refraction; Molecular beam epitaxy (MBE); Prism coupler; Reflectivity

Indexed keywords

ELLIPSOMETRY; MOLECULAR BEAM EPITAXY; REFRACTIVE INDEX; TERNARY SYSTEMS; X RAY DIFFRACTION ANALYSIS;

TERNARY ALLOYS;

BERYLLIUM COMPOUNDS;

EID: 0041766149     PISSN: 03615235     EISSN: None     Source Type: Journal    
DOI: 10.1007/s11664-003-0063-9     Document Type: Conference Paper

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