A review of techniques for polishing and planarizing chemically vapor-deposited (CVD) diamond films and substrates

Diamond and Related Materials

Volumn 8, Issue 7, 1999, Pages 1198-1213

  Malshe, A P ^a   Park, B S ^a   Brown, W D ^a   Naseem, H A ^a  

^a UNIVERSITY OF ARKANSAS   (United States)

Author keywords

Diamond; Planarizing; Polishing; Review

Indexed keywords

CHEMICAL VAPOR DEPOSITION; POLYCRYSTALLINE MATERIALS; SUBSTRATES; SURFACE ROUGHNESS; SURFACE TREATMENT;

NON UNIFORM THICKNESSES; PLANARIZATION;

DIAMOND FILMS;

EID: 0033164670     PISSN: 09259635     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0925-9635(99)00088-6     Document Type: Article

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