Hardness of C, CNx and AlN thin films after rapid thermal annealing

Materials Chemistry and Physics

Volumn 82, Issue 2, 2003, Pages 452-457

  Beshkov, G ^a   Vassilev, G P ^b   Elizalde, M R ^c   Gomez Acebo, T ^c  

^a INSTITUTE OF SOLID STATE PHYSICS   (Bulgaria)

^b UNIVERSITY OF SOFIA   (Bulgaria)

^c UNIVERSITY OF NAVARRA   (Spain)

Author keywords

Microhardness; Nanoindentation; Nitrides; Thin layers

Indexed keywords

ALUMINUM NITRIDE; CARBON; ELASTIC MODULI; HARDNESS; INDENTATION; RAPID THERMAL ANNEALING;

NANOINDENTATIONS;

THIN FILMS;

EID: 0041508958     PISSN: 02540584     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0254-0584(03)00280-3     Document Type: Article

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