Plasma-enhanced chemical vapor deposited silicon oxynitride films for optical waveguide bridges for use in mechanical sensors

Journal of the Electrochemical Society

Volumn 144, Issue 4, 1997, Pages 1505-1513

  Storgaard Larsen, Torben ^a   Leistiko, Otto ^a,b  

^a Bruel & Kjaer Danmark   (Denmark)

^b TECHNICAL UNIVERSITY OF DENMARK   (Denmark)

Author keywords

[No Author keywords available]

Indexed keywords

ANNEALING; CHEMICAL VAPOR DEPOSITION; OPTICAL WAVEGUIDES; PLASMAS; REFRACTIVE INDEX; SILICON COMPOUNDS;

ANNEALING TEMPERATURE; ANNEALING TIME; PLASMA-ENHANCED CHEMICAL VAPOR DEPOSITION; SILICON OXYNITRIDE FILMS;

THIN FILMS;

EID: 0031119168     PISSN: 00134651     EISSN: None     Source Type: Journal    
DOI: 10.1149/1.1837619     Document Type: Article

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