The history, physics, and applications of the Smart-Cut® process

MRS Bulletin

Volumn 23, Issue 12, 1998, Pages 35-39

  Bruel, Michel ^a  

^a NONE

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0040287325     PISSN: 08837694     EISSN: None     Source Type: Journal    
DOI: 10.1557/S088376940002981X     Document Type: Review

References (19)

1. J-P. Colinge, Silicon-on-Insulator Technology: Materials to VLSI, 2nd ed. (Kluwer Academic Publishers, Boston, Dordrecht, London, 1997).
2. M. Bruel, Nucl. Instrum. Methods Phys. Res. B 108 (1996) p. 313.
3. M. Kaminsky, IEEE Trans. Nucl. Sci. 18 (1971) p. 208.
4. W.K. Chu, R.H. Kastl, R.F. Lever, S. Mader, and B.J. Masters "Radiation Damage of 50-250 keV Hydrogen Ions in Silicon," in Ion Implantation in Semiconductors 1976, edited by F. Chernow, J.A. Borders, and D.K. Brice (Plenum Press, New York and London, 1976).
5. J.H. Evans, J. Nucl. Mater. 68 (1977) p. 129.
6. M. Bruel, Electron. Lett. 31 (14) (1995) p. 1201.
7. L. Di Cioccio, Y. Le Tiec, F. Letertre, C. Jaussaud, and M. Bruel, ibid. 32 (12) (1996) p. 1144.
8. E. Jalaguier, B. Aspar, S. Pocas, J.F. Michaud, M. Zussy, A.M. Papon, and M. Bruel, ibid. 34 (4) (1998) p. 408.
9. M.K. Weldon, V.E. Marsico, V.J. Chabla, A. Agarwal, D.J. Eaglesham, J. Sapjeta, W.L. Brown, D.C. Jacobson, Y. Caudano, S.B. Christman, and E.E. Chaban, J. Vac. Sci. Technol. B 15 (4) 1997.
10. M. Bruel, FR Patent No. 2,681,472 (October 29, 1993); U.S. Patent No. 5,374,564 (December 20, 1994).
11. A.J. Auberton-Hervé, J.M. Lamure, T. Barge, M. Bruel, B. Aspar, and J.L. Pelloie, Semicond. Int. 11 (1995) p. 97.
12. W.P. Maszara, in Proc. Fourth Int. Symp. on Silicon on Insulator Technology and Devices, edited by D.N. Schmidt, vol. 90 (Electrochemical Society, Pennington, NJ, 1990) p. 199.
13. Q-Y. Tong, R. Scholz, U. Gösele, T-H. Lee, L-J. Huang, Y-L. Chao, and T-Y. Tan, Appl. Phys. Lett. 72 (1) 1998 p. 49.
14. B. Aspar, M. Bruel, H. Monceau, C. Maleville, T. Poumeyrol, A.M. Papon, A. Claverie, G. Benassayag, A.J. Auberton-Hervé, and T. Barge, Microelectron. Eng. 36 (1997) p. 233.
15. B. Aspar, C. Lagahe, H. Moriceau, A. Soubie, M. Bruel, A.J. Auberton-Hervé, T. Barge, and C. Maleville, in Defects and Impurities in Semiconductors, (Mater Res. Soc. Symp. Proc. 510, Pittsburgh, 1998).
16. K.P. Hubert and G. Hezberg, Molecular Spectra and Molecular Structural Constants of Diatomic Molecules (Van Nostrand, New York, 1979).
17. S.J. Pearton, J.W. Corbett, and J.T. Borenstein, Physica B170 (1991) p. 85.
18. A. Agarwal, T.E. Haynes, V.V. Veneziza, O.W. Holland, and D.J. Eaglesham, Appl. Phys. Lett. 72 (9) (1998) p. 1086.
19. B. Aspar, M. Bruel, M. Zussy, and A.M. Cartier, Electron. Lett. 32 (21) (1996) p. 1985.