Highly oriented lead zirconium titanate thin films: Growth, control of texture, and its effect on dielectric properties

Journal of Applied Physics

Volumn 90, Issue 6, 2001, Pages 2703-2710

  Kalpat, S ^a   Uchino, K ^a  

^a PENNSYLVANIA STATE UNIVERSITY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0038843965     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1385580     Document Type: Article

References (32)

1. K. D. Wise, Proc. IEEE Micro Electro Mechanical Systems Workshop, Nara, 1991, p. 33.
2. M. Mehgany, Circuits Devices 1, 14 (1993).
3. X. Du, U. Belegundu, and K. Uchino, Jpn. J. Appl. Phys., Part 1 36, 5580 (1997).
4. I. M. Reaney, K. Brooks, R. Klissurska, C. Pawlaczyk, and N. Setter, J. Am. Ceram. Soc. 77, 1209 (1994).
5. S. Y. Chen, Mater. Chem. Phys. 45, 159 (1996).
6. J. Cheng, L. Luo, and Z. Meng, Proceedings of the 6th International Conference on Properties and Applications of Dielectric Materials (IEEE, Piscataway, NJ, 2000), Vol. 2, p. 930.
7. H. X. Qin, J. S. Zhu, Z. Q. Jin, and Y. Wang, Thin Solid Films 379, 72 (2000).
8. M. Klee, R. Eusemann, R. Waser, and W. Brand, J. Appl. Phys. 72, 1566 (1992).
9. R. Takayama and Y. Tomita, J. Appl. Phys. 65, 1666 (1989).
10. M. Adachi, T. Matsuzaki, T. Yamada, T. Shiosaki, and A. Kawabata, Jpn. J. Appl. Phys., Part 1 26, 550 (1987).
11. T. Maeder and P. Murait, Mater. Res. Soc. Symp. Proc. 341, 361 (1994).
12. R. Bouregba, G. Poullain, B. Vilquin, and H. Murray, Mater. Res. Bull. 35, 1381 (2000).
13. H. Fujita, S. Goto, S. Agata, M. Sakashita, A. Sakai, S. Zaima, and Y. Yasuda, 2000 International Microprocesses and Nanotechnology Conference, Tokyo, Japan, 2000, p. 276.
14. K. Iijima, I. Ueda, and K. Kugimiya, Jpn. J. Appl. Phys., Part 1 30, 2149 (1991).
15. C. Lee and J. Yeom, Jpn. J. Appl. Phys., Part 1 39, 6716 (2000).
16. S. B. Krupanidhi, N. Maffei, M. Sayer, and K. El-Assal, J. Appl. Phys. 54, 6601 (1983).
17. A. Mansingh, Ferroelectrics 102, 69 (1990).
18. R. W. Roy, K. Etzold, and J. J. Cuomo, Mater. Res. Soc. Symp. Proc. 200, 179 (1990).
19. A. Croteau and M. Sayer, Proceedings of the 6th IEEE International Symposium on the Application of Ferroelectrics, Bethlehem, PA (IEEE, New York, 1986), pp. 606-609.
20. R. Glang, Handbook of Thin Film Technology (McGraw-Hill, New York, 1970), p. 13.
21. M. Sayer, Proceeding of the 6th IEEE International Symposium on the Application of Ferroelectrics, Bethlehem, PA (IEEE, New York, 1986), p. 560.
22. K. Sreenivas and M. Sayer, J. Appl. Phys. 64, 1484 (1988).
23. F. Ayguavives, P. Aubert, B. Ea-Kim, and B. Agius, Mater. Res. Soc. Symp. Proc. 493, 333 (1998).
24. K. Brooks, I. M. Reaney, R. Klissurska, Y. Huang, L. Bursill, and N. Setter, J. Mater. Res. 9, 2540 (1994).
25. T. Ogawa, A. Senda, and T. Kasanami, Jpn. J. Appl. Phys., Part 1 30, 2145 (1991).
26. T. Tani, Z. Xu, and D. A. Payne, Mater. Res. Soc. Symp. Proc. 310, 269 (1993).
27. S. Kim, J. G. Hong, J. C. Gunter, H. Y. Lee, S. K. Streiffer, and A. I. Kingon, Mater. Res. Soc. Symp. Proc. 493, 269 (1998).
28. T. Maeder, P. Murait, L. Sagalowicz, and N. Setter, Microelectron. Eng. 29, 177 (1995).
29. G. R. Fox and S. B. Krupanidhi, J. Mater. Res. 9, 699 (1994).
30. K. Brooks, R. Klissurska, P. Moeckli, and N. Setter, J. Mater. Res. 12, 531 (1997).
31. J. Shepard, PhD. thesis, The Pennsylvania State University, 1999.
32. S. Kalpat, X. Du, I. R. Abothu, H. Goto, S. Trolier Mcknistry, and K. Uchino, Mater. Res. Soc. Symp. Proc. 604, 3 (2000).