Novel mold fabrication for nano-imprint lithography to fabricate single-electron tunneling devices

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 38, Issue 12 B, 1999, Pages 7272-7275

  Hirai, Yoshihiko ^a   Kanemaki, Yasuhito ^a   Murata, Kazuo ^b   Tanaka, Yoshio ^a  

^a Osaka Prefecture University   (Japan)

^b OSAKA MUNICIPAL TECHNICAL RESEARCH INSTITUTE   (Japan)

Author keywords

Anisotropic wet etching; Mold; Nano imprint lithography; Quantum dot; Single electron device

Indexed keywords

ETCHING; NANOTECHNOLOGY;

SINGLE ELECTRON DEVICES; WET ETCHING;

SEMICONDUCTOR QUANTUM DOTS;

EID: 0033319961     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/jjap.38.7272     Document Type: Article

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