Nanoimprint-induced effects on electrical and optical properties of quantum well structures

Microelectronic Engineering

Volumn 67-68, Issue , 2003, Pages 214-220

  Zankovych, S ^a   Maximov, I ^b   Shorubalko, I ^b   Seekamp, J ^a   Beck, M ^b   Romanov, S ^a   Reuter, D ^c   Schafmeister, P ^c   Wieck, A D ^c   Ahopelto, J ^d   Sotomayor Torres, C M ^a   Montelius, L ^b  

^a UNIVERSITY OF WUPPERTAL   (Germany)

^b LUND UNIVERSITY   (Sweden)

^c RUHR UNIVERSITY BOCHUM   (Germany)

^d VTT TECHNICAL RESEARCH CENTRE OF FINLAND   (Finland)

Author keywords

Nanoimprint lithography; Quantum transport; Quantum wells

Indexed keywords

CARRIER CONCENTRATION; ELECTRON GAS; HETEROJUNCTIONS; LITHOGRAPHY; PHOTOLUMINESCENCE; SEMICONDUCTING GALLIUM COMPOUNDS;

NANOIMPRINT LITHOGRAPHY;

SEMICONDUCTOR QUANTUM WELLS;

EID: 0038697364     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0167-9317(03)00074-1     Document Type: Conference Paper

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