Fabrication of semiconductor lasers with 2D-photonic crystal mirrors using a wet oxidized Al2O3-mask

Microelectronic Engineering

Volumn 57-58, Issue , 2001, Pages 1017-1021

  Moosburger, J ^a   Kamp, M ^a   Klopf, F ^a   Fischer, M ^a   Forchel, A ^a  

^a UNIVERSITY OF WÜRZBURG   (Germany)

Author keywords

Dry etching; Finite difference time domain; Photonic crystals; Ridge waveguide laser

Indexed keywords

ALUMINA; DENSITY (OPTICAL); DRY ETCHING; FABRICATION; FINITE DIFFERENCE METHOD; MASKS; MIRRORS; REFRACTIVE INDEX; TIME DOMAIN ANALYSIS;

PHOTONIC CRYSTALS; RIDGE WAVEGUIDE LASERS (RWG);

SEMICONDUCTOR LASERS;

EID: 0035450890     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0167-9317(01)00433-6     Document Type: Conference Paper

References (11)

1. Inhibited spontaneous emission in solid-state physics and electronics
2. High transmission through sharp bends in photonic crystal waveguides
3. Quantitative measurements of transmission, reflection and diffraction of two-dimensional photonic band gap structures at near-infrared wavelengths
4. Two-dimensional photonic-bandgap structures operating at near infrared wavelengths
5. Defect modes of a two-dimensional photonic crystal in an optically thin dielectric slab
6. Two-dimensional photonic band-gap defect mode laser
7. Optical characterization of waveguide based photonic microstructures
8. Bent laser cavity based on 2D photonic crystal waveguide
9. 1-xAs layers in a wet ambient
10. Selective oxidation of AlGaAs/GaAs structure and its application to vertical cavity lasers
11. Modal reflectivity in finite-depth two-dimensional photonic crystal microcavities