Linear internal inductively coupled plasma (ICP) source with magnetic fields for large area processing

Thin Solid Films

Volumn 435, Issue 1-2, 2003, Pages 275-279

  Lee, Y J ^a   Kim, K N ^a   Song, B K ^a   Yeom, G Y ^a  

^a Sungkyunkwan University   (South Korea)

Author keywords

Etching; Inductively coupled plasma; Large area plasma; Straight antenna

Indexed keywords

ANTENNAS; FLAT PANEL DISPLAYS; MAGNETIC FIELDS; PERMANENT MAGNETS;

HIGH DENSITY PLASMA;

INDUCTIVELY COUPLED PLASMA;

EID: 0038684629     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(03)00373-0     Document Type: Conference Paper

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