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Applied Physics Letters

Volumn 82, Issue 21, 2003, Pages 3683-3685

Metalorganic chemical vapor deposition of highly conductive Al0.65Ga0.35N films

(4) Cantu, P a Keller, S a Mishra, U K a DenBaars, S P a

a University of California (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CARRIER CONCENTRATION; DOPING (ADDITIVES); ELECTRIC CONDUCTIVITY; ELECTRON MOBILITY; FILM GROWTH; METALLIC FILMS; METALLORGANIC CHEMICAL VAPOR DEPOSITION; SILICON;

CATION VACANCIES;

ALUMINUM COMPOUNDS;

EID: 0038645891 PISSN: 00036951 EISSN: None Source Type: Journal
DOI: 10.1063/1.1577410 Document Type: Article

Times cited : (60)

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