Interplay of surface adsorption and preferential sputtering in metal plasma immersion ion implantation and deposition

Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms

Volumn 206, Issue , 2003, Pages 663-667

  Mandl S ^a   Manova, D ^a,b   Rauschenbach, B ^a  

^a Inst Oberflachenmodifizierung   (Germany)

^b UNIVERSITY OF AUGSBURG   (Germany)

Author keywords

Adsorption; Plasma immersion ion implantation; Rutherford backscattering spectroscopy; Sputtering

Indexed keywords

COMPOSITION; ELECTRIC POTENTIAL; GAS ADSORPTION; ION BEAM ASSISTED DEPOSITION; SPUTTERING; SURFACE PHENOMENA;

METAL PLASMA IMMERSION;

ION IMPLANTATION;

EID: 0038581247     PISSN: 0168583X     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0168-583X(03)00816-4     Document Type: Conference Paper

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