Homogeneity of metal plasma immersion ion implantation and deposition

Vacuum

Volumn 69, Issue 1-3, 2002, Pages 133-137

  Huber, P ^a   Manova, D ^a   Mandl S ^a,b   Rauschenbach, B ^b,c  

^a UNIVERSITY OF AUGSBURG   (Germany)

^b LEIBNIZ INSTITUTE OF SURFACE ENGINEERING IOM   (Germany)

^c UNIVERSITY OF LEIPZIG   (Germany)

Author keywords

Al; AlN; Plasma immersion implantation; RBS; Spectroscopic ellipsometry; Thin films; Ti; TiN; XRD

Indexed keywords

ADHESION; ELECTRIC POTENTIAL; ELLIPSOMETRY; THIN FILMS; TITANIUM NITRIDE; X RAY DIFFRACTION ANALYSIS;

PLASMA-IMMERSION-IMPLANTATION;

ION IMPLANTATION;

EID: 0037168458     PISSN: 0042207X     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0042-207X(02)00321-4     Document Type: Conference Paper

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