Formation of textured TiN-layers on Si by metal plasma immersion ion implantation and deposition

Proceedings of the International Conference on Ion Implantation Technology

Volumn , Issue , 2000, Pages 508-511

  Huber, P ^a   Manova, D ^a   Mandl S ^a   Assmann, W ^b   Rauschenbach, B ^a,c  

^a UNIVERSITY OF AUGSBURG   (Germany)

^b UNIVERSITY OF MUNICH   (Germany)

^c UNIVERSITY OF LEIPZIG   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

AMORPHISATION; ARC CURRENT; CONTAMINATION LEVELS; DEPOSITION CONDITIONS; DUTY CYCLES; ELASTIC RECOIL DETECTION ANALYSIS; FIBRE TEXTURE; HIGH VOLTAGE PULSE; METAL PLASMA IMMERSION ION IMPLANTATION AND DEPOSITION; POLE FIGURE MEASUREMENTS; ROOM TEMPERATURE; TIN FILMS;

BIAS VOLTAGE; ION IMPLANTATION; OXYGEN; PLASMA DEPOSITION; RUTHERFORD BACKSCATTERING SPECTROSCOPY; TITANIUM NITRIDE; X RAY DIFFRACTION;

ION BEAM ASSISTED DEPOSITION;

EID: 78649881894     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1109/.2000.924199     Document Type: Conference Paper

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