Plasma-sheath expansion around trenches in plasma immersion ion implantation

Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms

Volumn 206, Issue , 2003, Pages 803-807

  Rauschenbach, B ^a   Mandl S ^a  

^a LEIBNIZ INSTITUTE OF SURFACE ENGINEERING IOM   (Germany)

Author keywords

Concentration distribution; Particle in cell simulation; Plasma immersion implantation; Sputtering; Trench

Indexed keywords

ELECTRIC POTENTIAL; PLASMA SHEATHS; POISSON EQUATION; SPUTTERING; SURFACE TREATMENT;

PLASMA IMMERSION;

ION IMPLANTATION;

EID: 0038581237     PISSN: 0168583X     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0168-583X(03)00853-X     Document Type: Conference Paper

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