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Volumn 161, Issue , 2000, Pages 1085-1089

Trench homogeneity in plasma immersion ion implantation

Author keywords

[No Author keywords available]

Indexed keywords

COMPUTER SIMULATION; ELECTRONS; NEON; PLASMA APPLICATIONS; TWO DIMENSIONAL;

EID: 0033871242     PISSN: 0168583X     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0168-583X(99)00825-3     Document Type: Article
Times cited : (13)

References (12)


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.