Tribological properties of a-C:H films on Si substrate prepared by plasma CVD in pulse-biased process

Diamond and Related Materials

Volumn 12, Issue 3-7, 2003, Pages 1018-1023

  Wazumi, Koichiro ^a   Koga, Yoshinori ^b   Tanaka, Akihiro ^b  

^a JAPAN FINE CERAMICS CENTER   (Japan)

^b NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY AIST   (Japan)

Author keywords

Adhesion; Amorphous carbon; Plasma CVD; Tribology

Indexed keywords

BENZENE; COMPRESSIVE STRESS; ELECTRIC POTENTIAL; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; SILICON WAFERS; TRIBOLOGY; WEAR OF MATERIALS;

INTERNAL COMPRESSIVE STRESS;

AMORPHOUS FILMS;

DIAMOND;

EID: 0038522656     PISSN: 09259635     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0925-9635(02)00391-6     Document Type: Article

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