Comparison of Dielectric Characteristics of Ta 2O 5 Thin Films on RuO 2 and Ru Bottom Electrodes

Journal of the Electrochemical Society

Volumn 148, Issue 7, 2001, Pages

  Huang, J H ^a   Lai, Yi Sheng ^a   Chen, J S ^a,b  

^a NATIONAL CHENG KUNG UNIVERSITY   (Taiwan)

^b ELECTROCHEMICAL SOCIETY   (Taiwan)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0038503248     PISSN: 00134651     EISSN: None     Source Type: Journal    
DOI: 10.1149/1.1374218     Document Type: Review

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