Influence of magnetic field on magnetized hydrogen plasmas in plasma immersion ion implantation

Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms

Volumn 206, Issue , 2003, Pages 808-812

  Tang, D L ^a   Fu, R K Y ^a   Tian, X B ^a   Peng, P ^a   Chu, P K ^a  

^a CITY UNIVERSITY OF HONG KONG   (Hong Kong)

Author keywords

ICP; Magnetized plasma; PIII; Power absorption; RF

Indexed keywords

HYDROGEN; INDUCTIVELY COUPLED PLASMA; MAGNETIC FIELD EFFECTS; MAGNETIZATION; PLASMA DENSITY; PLASMA SHEATHS;

PLASMA IMMERSION;

ION IMPLANTATION;

EID: 0038413461     PISSN: 0168583X     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0168-583X(03)00854-1     Document Type: Conference Paper

References (18)

1. Hopwood J. Plasma Sources Sci. Technol. 1:1992;109.
2. Lee J.W., Abernathy C.R., Pearton S.J., Constantine C., Shul R.J., Hobson W.S. Plasma Sources Sci. Technol. 6:1997;499.
3. Sarfaty M., Baum C., Harper M., Hershkowitz N., Shohet J.L. Plasma Sources Sci. Technol. 7:1998;581.
4. Remashan K., Chua S.J., Ramam A., Prakash S., Liu W. Semicond. Sci. Technol. 15:2000;386.
5. Popov O.A. J. Vac. Sci. Technol. A. 7:1989;894.
6. Chen F.F. Plasma Phys. Controlled Fusion. 33:1991;339.
7. G.N. Steinberg, A.R. Reinberg, US Patent No. 4.368.092, 1983.
8. Husein I.F., Chan C., Qin S., Chu P.K. J. Phys. D: Appl. Phys. 33:2000;2869.
9. Lai C., Brunmeier B., Woods R.C. J. Vac. Sci. Technol. A. 13:1995;2086.
10. Hwang S.W., Lee Y.J., Han H.R., Yoo J.B., Yeom G.Y. J. Vac. Sci. Technol. A. 17:1999;1211.
11. Meziani T., Colpo P., Rossi F. Plasma Sources Sci. Technol. 10:2001;276.
12. W. Liu, S. Jose, M.A. Bryan, L. Gatos, I.S. Roth, P. Alto, US Patent No. 6300227B1, 2001.
13. Tong H.H., Fu R.K.Y., Tang D.L., Zeng X.C., Chu P.K. J. Appl. Phys. 92:2002;2284.
14. Hopwood J., Guarnieri C.R., Whitehair S.J., Cuomo J.J. J. Vac. Sci. Technol. A. 11:1993;147.
15. Forgotson N., Khemka V., Hopwood J. J. Vac. Sci. Technol. B. 14:1996;732.
16. Meziani T., Colpo P., Rossi F. Plasma Sources Sci. Technol. 10:2001;276.
17. J.G. Laframboise, Report No. 100, Institute for Aeronautics Studies, University of Toronto, 1996.
18. Lee H.J., Yang I.D., Whang K.W. Plasma Sources Sci. Technol. 5:1996;383. [blank_line]