Effective silicon oxide formation on silica-on-silicon platforms for optical hybrid integration

ETRI Journal

Volumn 25, Issue 2, 2003, Pages 73-80

  Kim, Tae Hong ^a   Sung, Hee Kyung ^a   Choi, Ji Won ^b   Yoon, Ki Hyun ^c  

^a Electronics and Telecommunications Research Institute (ETRI)   (South Korea)

^b Korea Institute of Science and Technology   (South Korea)

^c Yonsei University   (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

CRYSTAL DEFECTS; CRYSTAL GROWTH; DETERIORATION; ETCHING; INTERFACES (MATERIALS); OPTICAL WAVEGUIDES; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; SILICA; SILICON WAFERS; THERMOOXIDATION;

OPTICAL HYBRID INTEGRATION; PLANAR LIGHTWAVE CIRCUITS; SILICA FILM; SILICON ON SILICA PLATFORMS; SILICON OXIDE;

INTEGRATED OPTOELECTRONICS;

EID: 0038370185     PISSN: 12256463     EISSN: None     Source Type: Journal    
DOI: 10.4218/etrij.03.0102.0208     Document Type: Article

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