Process induced hillock defects on anisotropically etched silicon

Proceedings of the IEEE Micro Electro Mechanical Systems

Volumn , Issue , 1994, Pages 229-234

  Tan, Song sheng ^a   Han, Hongtao ^a   Boudreau, Robert ^a   Reed, Michael L ^a  

^a SHANGHAI INSTITUTE OF MICROSYSTEM AND INFORMATION TECHNOLOGY   (China)

Author keywords

[No Author keywords available]

Indexed keywords

ANISOTROPY; DEFECTS; MASKS; MICROMACHINING; MICROSCOPIC EXAMINATION; OPTICAL WAVEGUIDES; OPTOELECTRONIC DEVICES; SEMICONDUCTING SILICON; SEMICONDUCTOR DOPING;

ANISOTROPIC ETCHING; ETCH HILLOCK DEFECT; SILICON REMOVAL; SILICON WAFER;

ETCHING;

EID: 0028112829     PISSN: None     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Article

References (17)