Comparison between the complexant alkaline etching systems of silicon

Proceedings of the International Semiconductor Conference, CAS

Volumn 1, Issue , 1999, Pages 205-208

  Moldovan, Carmen ^a   Iosub, Rodica ^a   Dascalu, Dan ^a   Marin, Gheorghe ^a   Danila, Carmen ^a  

^a National Institute for Research in Informatics   (Romania)

Author keywords

[No Author keywords available]

Indexed keywords

ANISOTROPY; CAUSTIC SODA; ETCHING; LITHIUM COMPOUNDS; POTASSIUM COMPOUNDS; SOLUTIONS;

ANISOTROPIC ETCHING; HILLOCKS ELIMINATION; POTASSIUM HYDROXIDE;

SEMICONDUCTING SILICON;

EID: 0033320530     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Article

References (5)