Anisotropic plasma etching of polymers using a cryo-cooled resist mask

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 18, Issue 2, 2000, Pages 385-388

  Schuppert B ^a   Brose, E ^a   Petermann, K ^a   Moosburger, R ^b  

^a TECHNISCHE UNIVERSITÄT BERLIN   (Germany)

^b Virtual Photonics Inc   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

ANISOTROPY; COOLING; MASKS; OPTICAL WAVEGUIDES; PHOTORESISTS; PLASMA ETCHING; REACTIVE ION ETCHING; SURFACE ROUGHNESS;

ANISOTROPIC PLASMA ETCHING; OPTICAL SCATTERING LOSS; PERFLUOROCYCLOBUTENE POLYMER; SPIN COATED PHOTORESIST MASK;

FLUORINE CONTAINING POLYMERS;

EID: 0342572481     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.582197     Document Type: Article

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