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Volumn 44, Issue 3, 2000, Pages 379-390

Future of interconnection technology

(1)  Theis, T N a  

a NONE

Author keywords

[No Author keywords available]

Indexed keywords

INSULATING MATERIALS; INTEGRATED CIRCUIT LAYOUT; MICROPROCESSOR CHIPS; OPTICAL INTERCONNECTS; PERMITTIVITY;

EID: 0033689943     PISSN: 00188646     EISSN: None     Source Type: Journal    
DOI: 10.1147/rd.443.0379     Document Type: Article
Times cited : (120)

References (29)
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    • (1999) Electrochemical Processing in ULSI Fabrication I and Interconnect and Contact Metallization: Materials, Processes, and Reliability , vol.98 , Issue.6 , pp. 1-11
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    • 0032026510 scopus 로고    scopus 로고
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    • J. A. Davis, V. K. De, and J. D. Meindl, "A Stochastic Wire-Length Distribution for Gigascale Integration (GSI) - Part I: Derivation and Validation," IEEE Trans. Electron Devices 45, 580 (1998).
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  • 20
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    • Dense two-dimensional integration of optoelectronics and electronics for interconnections
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    • D. A. B. Miller, "Dense Two-Dimensional Integration of Optoelectronics and Electronics for Interconnections," Heterogeneous Integration: Systems on a Chip, A. Husain and M. Fallahi, Eds., SPIE Critical Reviews of Optical Engineering, Vol. CR70, SPIE, Bellingham, WA, 1998, pp. 80-109 and references therein.
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    • Physical reasons for optical interconnection
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* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.