Comparison of classical and BEN nucleation studied on thinned Si (1 1 1) samples: A HRTEM study

Applied Surface Science

Volumn 212-213, Issue SPEC., 2003, Pages 912-919

  Arnault, J C ^a   Pecoraro, S ^a   Le Normand, F ^a   Werckmann, J ^a  

^a INSTITUT DE PHYSIQUE ET CHIMIE DES MATÉRIAUX DE STRASBOURG   (France)

Author keywords

Bias enhanced nucleation; Diamond; HFCVD; HRTEM; Nucleation mechanisms

Indexed keywords

CHEMICAL VAPOR DEPOSITION; DIAMONDS; DIFFRACTION; NUCLEATION; TRANSMISSION ELECTRON MICROSCOPY;

BIAS ENHANCED NUCLEATION (BEN);

SILICON;

EID: 0038209550     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0169-4332(03)00086-2     Document Type: Conference Paper

References (18)

1. A. Prelas, G. Popovici, P. Bigelov, Handbook of Industrial Diamonds and Diamond Films, Marcel Dekker, New York, 1997.
2. R.S. Sussmann, Diamond: the industrial landscape, in: Y. Tzeng, K. Miyoshi, M. Yoshikawa, M. Murakawa, Y. Koga, K. Kobashi, G.A.J. Amaratunga (Eds.), Proceedings of the ADC/FCT, 2001.
3. J.C. Arnault, Highly oriented diamond films on hetero-substrates: current state of the art and remaining challenges (review paper), Surf. Rev. Lett., 2003, in press.
4. Yugo S., Kanai T., Kimura T., Muto T. Appl. Phys. Lett. 58:1991;1036.
5. Kawarada H., Wild C., Herres N., Locher R., Koidl P. J. Appl. Phys. 81:1997;3490.
6. Jiang X., Schiffmann K., Klages C.P., Wittorf D., Jia C.L., Urban K., Jaeger W. J. Appl. Phys. 83:1998;2511.
7. Schreck M., Hörmann F., Roll H., Bauer T., Stritzker B. New Diam. Front. Carbon Technol. 11:2001;189.
8. Wittorf D., Jäger W., Dieker C., Floter A., Guttler H. Diam. Relat. Mater. 9:2000;1696.
9. Lin T., Loh K.P., Wee A.T.S., Shen Z.X., Lin J., Lai C.H., Gao Q.J., Chang T.J. Diam. Relat. Mater. 9:2000;1703.
10. Lee S.T., Peng H.Y., Zhou X.T., Wang N., Lee C.S., Bello I., Lifshitz Y. Science. 287:2000;104.
11. Arnault J.C., Pecoraro S., Werckmann J., Le Normand F. Diam. Relat. Mater. 10:2001;1612.
12. Le Normand F., Arnault J.C., Pecoraro S., Werckmann J. Appl. Surf. Sci. 177:2001;298.
13. Thürer K.H., Schreck M., Stritker B. Phys. Rev. B. 57:1998;15454.
14. Jiang X., Klages C.P. Ceramics Int. 22:1996;443.
15. Jiang X., Jia C.L. Phys. Rev. Lett. 84:2000;3658.
16. Hanbücken M., Vianey I., Degiovanni A., Jourdan C., Röttger B., Kliese R., Neddermeyer H. Appl. Surf. Sci. 72:1993;79.
17. Mahalingam P., Liu H., Dandy D.S. J. Appl. Phys. 81:1997;1966.
18. Demuynck L., Arnault J.C., Polini R., Le Normand F. Surf. Sci. 377:1997;871.