Early stages of the HFCVD process on multi-vicinal silicon surfaces studied by electron microscopy probes (SEM, TEM)

Diamond and Related Materials

Volumn 10, Issue 9-10, 2001, Pages 1612-1616

  Arnault, J C ^a   Pecoraro, S ^a   Werckmann, J ^a   Le Normand, F ^a   Motta, N ^b   Polini, R ^b  

^a INSTITUT DE PHYSIQUE ET CHIMIE DES MATÉRIAUX DE STRASBOURG   (France)

^b UNIVERSITY OF ROME TOR VERGATA   (Italy)

Author keywords

Diamond; Nucleation; Silicon step; Transmission electron microscopy

Indexed keywords

CHEMICAL VAPOR DEPOSITION; CRYSTAL DEFECTS; CRYSTALS; HEAT TREATMENT; NUCLEATION; SILICON;

MULTI VICINAL SURFACES;

DIAMONDS;

DIAMOND;

EID: 0035449309     PISSN: 09259635     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0925-9635(01)00420-4     Document Type: Article

References (23)

1. Diamond films: Recent developments