A development of photoresist material for low energy electron beam lithography

Journal of Photopolymer Science and Technology

Volumn 16, Issue 3, 2003, Pages 459-461

  Saito, Satoshi ^a   Nakasugi, Tetsuro ^a  

^a TOSHIBA CORPORATION   (Japan)

Author keywords

Acetal; AFM; EB; LER; Line edge roughnes

Indexed keywords

ARTICLE; ATOMIC FORCE MICROSCOPY; ELECTRON BEAM LITHOGRAPHY; EXPERIMENTATION; MOLECULAR WEIGHT; PROCESS TECHNOLOGY; SURFACE PROPERTY;

EID: 0038168310     PISSN: 09149244     EISSN: None     Source Type: Journal    
DOI: 10.2494/photopolymer.16.459     Document Type: Article

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