Maskless lithography using low-energy electron beam: Recent results for proof-of-concept system

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 20, Issue 6, 2002, Pages 2651-2656

  Nakasugi, T ^a   Ando, A ^a   Inanami, R ^a   Sasaki, N ^a   Ota, T ^a   Nagano, O ^a   Yamazaki, Y ^a   Sugihara, K ^a   Mori, I ^a   Miyoshi, M ^b   Okumura, K ^b   Fujioka, H ^c  

^a TOSHIBA CORPORATION   (Japan)

^b UNIVERSITY OF TOKYO   (Japan)

^c OSAKA UNIVERSITY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

COST ACCOUNTING; ELECTROSTATIC LENSES; INTEGRATED CIRCUIT MANUFACTURE; LOGIC DEVICES; MICROPROCESSOR CHIPS; SCANNING ELECTRON MICROSCOPY;

CHARACTER PROJECTION; DEFLECTORS; LOW ENERGY ELECTRON BEAM DIRECT WRITING; PROOF OF CONCEPT SYSTEM; PROXIMITY EFFECT CORRECTION; SYSTEM ON A CHIP;

ELECTRON BEAM LITHOGRAPHY;

EID: 0036883139     PISSN: 0734211X     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.1520562     Document Type: Article

References (6)

1. K. Okumura, Proceedings of the Workshop on Semiconductor Technology for 21st Century, Tokyo, Japan, 6-7 June 2000, pp. 3-55 (in Japanese).
2. K. Sugihara, Technical Program of SEMI Technology Symposium, Chiba, Japan, 6-8 December 2000, pp. 3-7.
3. R. Inanami, S. Magoshi, S. Kousai, M. Hamada, T. Takayanagi, K. Sugihara, K. Okumura, and T. Kuroda, Technical Digest of International Electron Devices Meeting, San Francisco, CA, 11-13 December 2000, pp. 833-836.
4. T. Nakasugi, A. Ando, M. Miyoshi, K. Sugihara, Y. Yamazaki, and K. Okumura, J. Vac. Sci. Technol. B 19, 2869 (2001).
5. A. Ando, T. Nakasugi, K. Sugihara, O. Nagano, Y. Yamazaki, M. Miyoshi, and K. Okumura, Technical Program of EIPBN 2001, Washington, DC, 29 May-1 June, p. 64-65.
6. T. Nakasugi, S. Magoshi, K. Sugihara, S. Saito, and N. Kihara, Jpn. J. Appl. Phys., Part 1 37, 6756 (1998).