Theoretical study on stable structures and diffusion mechanisms of B in SiO 2

Applied Surface Science

Volumn 216, Issue 1-4 SPEC., 2003, Pages 490-496

  Otani, Minoru ^a   Shiraishi, Kenji ^a   Oshiyama, Atsushi ^a  

^a UNIVERSITY OF TSUKUBA   (Japan)

Author keywords

Atomic boron; Boron penetration; Diffusion path; Energy barrier; First principle calculations; SiO 2

Indexed keywords

ACTIVATION ENERGY; BORON; CHEMICAL BONDS; DIFFUSION;

STABLE STRUCTURES;

SILICA;

EID: 0038007855     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0169-4332(03)00406-9     Document Type: Conference Paper

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