Optical emission study of CH4 + CHF3 ECR plasma and properties of a-C:F:H films

Surface and Coatings Technology

Volumn 173, Issue 2-3, 2003, Pages 172-177

  Xin, Y ^a   Ning, Z Y ^a   Ye, C ^a   Lu, X H ^b   Xiang, S L ^b   Du, W ^a   Huang, S ^a   Chen, J ^a   Cheng, S H ^a  

^a SUZHOU VOCATIONAL UNIVERSITY   (China)

^b SOOCHOW UNIVERSITY   (China)

Author keywords

a C:F:H films; FTIR; Optical band gap; Optical emission spectroscopy

Indexed keywords

CHEMICAL VAPOR DEPOSITION; CYCLOTRON RESONANCE; ENERGY GAP; FOURIER TRANSFORM INFRARED SPECTROSCOPY; MICROWAVES; POLYTETRAFLUOROETHYLENES;

GAS FLOW;

COATINGS;

FILM;

EID: 0037929885     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0257-8972(03)00624-8     Document Type: Article

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