Photochemical lithography: Creation of patterned, acid chloride functionalized surfaces using UV light and gas-phase oxalyl chloride

Langmuir

Volumn 19, Issue 11, 2003, Pages 4856-4858

  Husseini, G A ^a   Niederhauser, T L ^a   Peacock, J G ^a   Vernon, M R ^a   Lua, Y Y ^a   Asplund, M C ^a   Sevy, E T ^a   Linford, M R ^a  

^a Brigham Young University   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ACID CHLORIDE; GAS PHASE OXALYL CHLORIDE; ORGANIC MONOLAYERS; PHOTOCHEMICAL LITHOGRAPHY;

CHEMICAL ACTIVATION; CHLORINE COMPOUNDS; HYDROPHOBICITY; LITHOGRAPHY; PHOTOCHEMICAL REACTIONS; SUBSTITUTION REACTIONS; SYNTHESIS (CHEMICAL); ULTRAVIOLET RADIATION;

MONOLAYERS;

EID: 0037905345     PISSN: 07437463     EISSN: None     Source Type: Journal    
DOI: 10.1021/la020896g     Document Type: Article

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