Alkyl Monolayers on Silica Surfaces Prepared from Neat, Heated ClSi(CH3)2(CH2)17CH3 Analyzed by XPS

Surface Science Spectra

Volumn 8, Issue 4, 2001, Pages 274-283

  Husseini, Ghaleb A ^a   Zilch, Lloyd W ^a   Sevy, Eric T ^a   Asplund, Matthew C ^a   Linford, Matthew R ^a  

^a Brigham Young University   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

MONOLAYERS; SILANES; SILICA; SILICON OXIDES; SILICON WAFERS;

ALKYL MONOLAYERS; DICHLOROSILANES; MONOCHLOROSILANES; REACTION WITH WATERS; SILANE MONOLAYERS; SILICA SURFACE; SURFACE FUNCTIONALIZATION; SURFACE-MODIFICATION; TRICHLOROSILANES; XPS SPECTRUM;

X RAY PHOTOELECTRON SPECTROSCOPY;

EID: 0037520562     PISSN: 10555269     EISSN: 15208575     Source Type: Journal    
DOI: 10.1116/11.20020502     Document Type: Article

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