Infrared grisms using anisotropic etching of silicon to produce a highly asymmetric groove profile

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 4850, Issue 2, 2002, Pages 805-812

  Ershov, O A ^a   Marsh, J P ^a   Allers, K N ^a   Jaffe, D T ^a  

^a University of Texas at Austin   (United States)

Author keywords

Anisotropic etching; Asymmetric groove profile; Silicon grism

Indexed keywords

ANISOTROPY; ETCHING; INFRARED IMAGING; INFRARED SPECTROMETERS; INFRARED SPECTROSCOPY; INFRARED TRANSMISSION; LIGHT REFLECTION; REFRACTIVE INDEX; SCANNING ELECTRON MICROSCOPY; SILICON WAFERS;

GRISMS;

DIFFRACTION GRATINGS;

EID: 0037725196     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.461794     Document Type: Conference Paper

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