Production of high-order micromachined silicon echelles on optically flat substrates

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 4440, Issue , 2001, Pages 301-308

  Ershov, Oleg A ^a   Jaffe, Daniel T ^a   Marsh, Jasmina P ^a   Keller, Luke D ^a  

^a University of Texas at Austin   (United States)

Author keywords

Diffraction limited image; Echelle; Optically flat; Wet etching

Indexed keywords

DIFFRACTION GRATINGS; MASKS; MICROMACHINING; OPTICAL RESOLVING POWER; OPTICAL TESTING; PHOTORESISTS; PRISMS; REACTIVE ION ETCHING; SILICON WAFERS;

SILICON ECHELLES;

INFRARED SPECTROMETERS;

EID: 0035759998     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.448052     Document Type: Conference Paper

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